SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVI - Yokohama, Japan (Wednesday 8 April 2009)] Photomask and Next-Generation Lithography Mask Technology XVI - A new approach to reticle haze defect management in the fab
Gau, Yeu-Dong, Hosono, Kunihiro, Hsiao, Kevin, Hsu, Wen-Hao, Lu, Yu-Min, Chen, Chun-Chieh, Liu, Chen Min, Van Riet, Mike, Gaspar, Noah, Yu, Chien-Chun, Chan, PhillipVolume:
7379
Year:
2009
Language:
english
DOI:
10.1117/12.824294
File:
PDF, 510 KB
english, 2009