SPIE Proceedings [SPIE SPIE Lithography Asia - Taipei, Taiwan (Wednesday 18 November 2009)] Lithography Asia 2009 - Litho scenario solutions for FinFET SRAM 22nm node
Tseng, Shih-En, Chen, Alek C., Han, Woo-Sung, Wu, Shun-Der, Wang, Jacques, Lin, Burn J., Yen, Anthony, Kou, Jay, Mouraille, Orion, Jungblut, Reiner, Chiou, Tsann-Bim, Finders, Jo, Chen, Alek, Dusa, MiVolume:
7520
Year:
2009
Language:
english
DOI:
10.1117/12.837495
File:
PDF, 1.46 MB
english, 2009