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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Optical Microlithography XXIII - Spacer defined double patterning for sub-72 nm pitch logic technology
Kim, Ryoung-Han, Dusa, Mircea V., Conley, Will, Mclellan, Erin, Yin, Yunpeng, Arnold, John, Kanakasabapathy, Sivananda, Mehta, Sanjay, Ma, Yuansheng, Burkhardt, Martin, Cain, Jason, McIntyre, Greg, CoVolume:
7640
Year:
2010
Language:
english
DOI:
10.1117/12.846698
File:
PDF, 1.44 MB
english, 2010