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SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Substrate aware OPC rules for edge effect in block levels
Shao, Dongbing, Montgomery, M. Warren, Maurer, Wilhelm, Bailey, Todd C., Stobert, Ian, Popova, Irene, Chang, Chan SamVolume:
7823
Year:
2010
Language:
english
DOI:
10.1117/12.865134
File:
PDF, 1.16 MB
english, 2010