SPIE Proceedings [SPIE 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies - Dalian, China (Monday 26 April 2010)] 5th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Optical Test and Measurement Technology and Equipment - Uniform illumination for large area digital speckle pattern interferometry using multibeam
Huang, Zhanhua, Zhang, Yudong, Sasián, José, Zhu, Meng, Cai, Huaiyu, Xiang, Libin, Zhang, Yinxin, To, SandyVolume:
7656
Year:
2010
Language:
english
DOI:
10.1117/12.865157
File:
PDF, 367 KB
english, 2010