SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVII - Yokohama, Japan (Tuesday 13 April 2010)] Photomask and Next-Generation Lithography Mask Technology XVII - A novel pattern error detecting algorithm for SEM images of mask monitoring patterns
Oh, Yoonna, Hosono, Kunihiro, Shin, Jae-Pil, Choi, Jin, Lee, Jong-Bae, Yoo, Moon-HyunVolume:
7748
Year:
2010
Language:
english
DOI:
10.1117/12.866273
File:
PDF, 2.05 MB
english, 2010