SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Alternative Lithographic Technologies III - Guided self-assembly of block-copolymer for CMOS technology: a comparative study between grapho-epitaxy and surface chemical modification
Oria, Lorea, Herr, Daniel J. C., Ruiz de Luzuriaga, Alaitz, Chevalier, Xavier, Alduncin, Juan A., Mecerreyes, David, Tiron, Raluca, Gaugiran, Stephanie, Perez-Murano, FrancescVolume:
7970
Year:
2011
Language:
english
DOI:
10.1117/12.878486
File:
PDF, 13.55 MB
english, 2011