SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Optical Microlithography XXIV - Scanner alignment performance for double patterning
Lattard, L., McCallum, M., Morton, R., Lapeyre, C., Makino, K., Tokui, A., Takahashi, N., Fujiwara, T.Volume:
7973
Year:
2011
Language:
english
DOI:
10.1117/12.878953
File:
PDF, 3.17 MB
english, 2011