SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Advances in Resist Materials and Processing Technology XXIX - EUV resist processing with flash-lamp
Santillan, Julius Joseph, Kaneyama, Koji, Morita, Akihiko, Fuse, Kazuhiko, Kiyama, Hiroki, Asai, Masaya, Itani, Toshiro, Somervell, Mark H., Wallow, Thomas I.Volume:
8325
Year:
2012
Language:
english
DOI:
10.1117/12.916342
File:
PDF, 1.71 MB
english, 2012