SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Advances in Resist Materials and Processing Technology XXIX - Demonstration of 22nm SRAM features with patternable hafnium oxide-based resist material using electron-beam lithography
Thrun, Xaver, Choi, Kang-Hoon, Freitag, Martin, Grenville, Andrew, Gutsch, Manuela, Hohle, Christoph, Stowers, Jason K., Bartha, Johann W., Somervell, Mark H., Wallow, Thomas I.Volume:
8325
Year:
2012
Language:
english
DOI:
10.1117/12.917814
File:
PDF, 3.69 MB
english, 2012