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SPIE Proceedings [SPIE Microlithography Conference - Santa Clara, CA (Monday 2 March 1987)] Advances in Resist Technology and Processing IV - A Novel, Diazonium-Phenolic Resin Two-Layer Resist System Utilizing Photoinduced Interfacial Insolubilization
Uchino, Shou-ichi, Iwayanagi, Takao, Ueno, Takumi, Hashimoto, Michiaki, Nonogaki, Saburo, Bowden, Murrae J.Volume:
771
Year:
1987
Language:
english
DOI:
10.1117/12.940302
File:
PDF, 5.15 MB
english, 1987