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SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Advances in Resist Technology and Processing VI - A Chemical Reaction And Influence Of Deep-UV Light Wavelength On REL (Resolution Enhanced Lithography)
Fukumoto, H., Okuda, Y., Takashima, Y., Ohkuma, T., Ueda, S., Inoue, M., Reichmanis, ElsaVolume:
1086
Year:
1989
Language:
english
DOI:
10.1117/12.953018
File:
PDF, 3.67 MB
english, 1989