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SPIE Proceedings [SPIE 1989 Microlithography Conferences - San Jose, CA (Monday 27 February 1989)] Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies VIII - Novel Chemical Amplification System in Azide/Phenolic Resin-Based Negative Resist
Aoki, Emiko, Shiraishi, Hiroshi, Hashimoto, Michiaki, Hayashi, Nobuaki, Yanof, Arnold W.Volume:
1089
Year:
1989
Language:
english
DOI:
10.1117/12.968541
File:
PDF, 1.58 MB
english, 1989