Thin film deposition at atmospheric pressure using...

Thin film deposition at atmospheric pressure using dielectric barrier discharges: Advances on three-dimensional porous substrates and functional coatings

Fanelli, Fiorenza, Bosso, Piera, Mastrangelo, Anna Maria, Fracassi, Francesco
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Volume:
55
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.7567/JJAP.55.07LA01
Date:
July, 2016
File:
PDF, 2.58 MB
english, 2016
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