Decomposition of SiOx Films Due to Internal Stress

physica status solidi (b) 1983 Vol. 118; Iss. 1

Decomposition of SiOx Films Due to Internal Stress

K. Hübner, A. V. Shendrik, A. M. Praulinsh
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Volume:
118
Year:
1983
Language:
english
Pages:
6
DOI:
10.1002/pssb.2221180129
File:
PDF, 432 KB
english, 1983
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