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SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Optical/Laser Microlithography VII - Optimization of modified illumination for 0.25-um resist patterning
Tounai, Keiichiro, Hashimoto, Shuichi, Shiraki, Seiichi, Kasama, Kunihiko, Brunner, Timothy A.Volume:
2197
Year:
1994
Language:
english
DOI:
10.1117/12.175436
File:
PDF, 572 KB
english, 1994