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SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV - Pulsed electron-beam source for high-resolution high-throughput microlithography
Hsu, Tseng-Yang, Hadizad, Peyman, Liou, Rong L., Roth, Greg, Gundersen, Martin A., Patterson, David O.Volume:
2194
Year:
1994
Language:
english
DOI:
10.1117/12.175813
File:
PDF, 370 KB
english, 1994