SPIE Proceedings [SPIE SPIE's 1994 Symposium on Microlithography - San Jose, CA (Sunday 27 February 1994)] Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV - Comparative study of x-ray lithography process optimization using theoretical and empirical tools
Waldo, Whitson G., Capasso, Cristiano, Krasnoperova, Azalia A., Khan, Mumit, Taylor, James W., Cerrina, Franco, Patterson, David O.Volume:
2194
Year:
1994
Language:
english
DOI:
10.1117/12.175833
File:
PDF, 404 KB
english, 1994