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SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Electron-Beam, X-Ray, and Ion-Beam Technology: Submicrometer Lithographies IX - Charge-up prevention process for e-beam direct writing with multilayer resist
Tono-oka, Yoji, Sakamoto, Kazuyuki, Honda, Toshiyuki, Matsumoto, Hiroshi, Iida, Yasuo, Resnick, Douglas J.Volume:
1263
Year:
1990
Language:
english
DOI:
10.1117/12.20159
File:
PDF, 351 KB
english, 1990