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SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V - Performance of IBM's EL-4 e-beam lithography system
Rockrohr, James D., Butsch, R., Enichen, W. A., Gordon, Michael S., Groves, Timothy R., Hartley, John G., Pfeiffer, Hans C., Warlaumont, John M.Volume:
2437
Year:
1995
Language:
english
DOI:
10.1117/12.209156
File:
PDF, 470 KB
english, 1995