SPIE Proceedings [SPIE SPIE's 1995 Symposium on Microlithography - Santa Clara, CA (Sunday 19 February 1995)] Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing V - Extreme UV resist technology: the limits of silylated resist resolution
Taylor, Gary N., Hutton, Richard S., Stein, Susan M., Boyce, Craig H., Wood II, Obert R., LaFontaine, Bruno, MacDowell, Alastair A., Wheeler, David R., Kubiak, Glenn D., Ray-Chaudhuri, Avijit K., BergVolume:
2437
Year:
1995
Language:
english
DOI:
10.1117/12.209168
File:
PDF, 1.77 MB
english, 1995