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SPIE Proceedings [SPIE SPIE Photonics Europe - Brussels, Belgium (Sunday 3 April 2016)] Optical Modelling and Design IV - Shallow etch electrical isolation in capacitively loaded Mach-Zehnder modulators
Wyrowski, Frank, Sheridan, John T., Meuret, Youri, Morrissey, Padraic E., Marraccini, Philip J., Jezzini, Moises A., Peters, Frank H.Volume:
9889
Year:
2016
Language:
english
DOI:
10.1117/12.2224583
File:
PDF, 537 KB
english, 2016