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SPIE Proceedings [SPIE SPIE's 1996 International Symposium on Microlithography - Santa Clara, CA (Sunday 10 March 1996)] Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI - Damage characterization of SiN x-ray mask membrane caused by electron-beam exposure
Choi, Sang-Soo, Jeon, Young Jin, Kim, Jong-Soo, Chung, Hai Bin, Lee, Sang-Yun, Lee, Jong-Hyun, Yoo, Hyung Joun, Seeger, David E.Volume:
2723
Year:
1996
Language:
english
DOI:
10.1117/12.240484
File:
PDF, 400 KB
english, 1996