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SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Advances in Resist Technology and Processing XIV - Enhancing the development-rate model for optimum simulation capability in the subhalf-micron regime
Arthur, Graham G., Martin, Brian, Mack, Chris A., Tarascon-Auriol, Regine G.Volume:
3049
Year:
1997
Language:
english
DOI:
10.1117/12.275818
File:
PDF, 671 KB
english, 1997