SPIE Proceedings [SPIE ISMA '97 International Symposium on...

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SPIE Proceedings [SPIE ISMA '97 International Symposium on Microelectronics and Assembly - Singapore, Singapore (Monday 23 June 1997)] Microlithographic Techniques in IC Fabrication - Comparison of different optical proximity correction models with three-dimensional photolithography simulation over planar substrates

Rey, Juan C., Li, Jiangwei, Boksha, Victor V., Bernard, Douglas A., Yoon, Soon Fatt, Yu, Raymond, Mack, Chris A.
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Volume:
3183
Year:
1997
Language:
english
DOI:
10.1117/12.280553
File:
PDF, 2.56 MB
english, 1997
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