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SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - New method for determination of the photoresist Dill parameters using spectroscopic ellipsometry
Boher, Pierre, Defranoux, Christophe, Piel, Jean-Philippe, Stehle, Jean-Louis P., Conley, WillVolume:
3678
Year:
1999
Language:
english
DOI:
10.1117/12.350195
File:
PDF, 1.25 MB
english, 1999