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SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Advances in Resist Technology and Processing XVI - CVD photoresist performance for 248-nm lithography
Monget, Cedric, Joubert, Olivier P., Weidman, Timothy W., Toublan, Olivier, Panabiere, Jean-Pierre, Weill, Andre P., Conley, WillVolume:
3678
Year:
1999
Language:
english
DOI:
10.1117/12.350265
File:
PDF, 1.19 MB
english, 1999