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SPIE Proceedings [SPIE Microlithography '99 - Santa Clara, CA (Sunday 14 March 1999)] Optical Microlithography XII - New application of negative DUV resist for topographical metal layer microlithography
Chen, Yung-Tin, Chu, Ronfu, Van den Hove, LucVolume:
3679
Year:
1999
Language:
english
DOI:
10.1117/12.354300
File:
PDF, 1.35 MB
english, 1999