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SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Modeling chemically amplified resists for 193-nm lithography
Croffie, Ebo H., Cheng, Mosong, Neureuther, Andrew R., Houlihan, Francis M., Cirelli, Raymond A., Sweeney, James R., Dabbagh, Gary, Watson, Pat G., Nalamasu, Omkaram, Rushkin, Ilya L., Dimov, Ognian NVolume:
3999
Year:
2000
Language:
english
DOI:
10.1117/12.388300
File:
PDF, 916 KB
english, 2000