SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara,...

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SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Modeling chemically amplified resists for 193-nm lithography

Croffie, Ebo H., Cheng, Mosong, Neureuther, Andrew R., Houlihan, Francis M., Cirelli, Raymond A., Sweeney, James R., Dabbagh, Gary, Watson, Pat G., Nalamasu, Omkaram, Rushkin, Ilya L., Dimov, Ognian N
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Volume:
3999
Year:
2000
Language:
english
DOI:
10.1117/12.388300
File:
PDF, 916 KB
english, 2000
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