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SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Advances in Resist Technology and Processing XVII - Environmentally stable lithography with acidity-optimized TARC material
Asahi, Kenichi, Tani, Yoshiyuki, Yoshida, Ryuichi, Shimomura, Koji, Takano, Yusuke, Nishiwaki, Yoshino, Tanaka, Hatsuyuki, Houlihan, Francis M.Volume:
3999
Year:
2000
Language:
english
DOI:
10.1117/12.388359
File:
PDF, 1.18 MB
english, 2000