SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - Ultranarrow-bandwidth excimer lasers for 248-nm DUV lithography
Paetzel, Rainer, Albrecht, Hans Stephen, Berger, Vadim, Bragin, Igor, Kramer, Matthias, Kleinschmidt, Juergen, Serwazi, Marcus, Progler, Christopher J.Volume:
4000
Year:
2000
Language:
english
DOI:
10.1117/12.388985
File:
PDF, 190 KB
english, 2000