SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Emerging Lithographic Technologies IV - Coulomb image distortion in charge particle projection systems: scattering function of arbitrary image point
Freinkman, Boris G., Dobisz, Elizabeth A.Volume:
3997
Year:
2000
Language:
english
DOI:
10.1117/12.390109
File:
PDF, 291 KB
english, 2000