SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Emerging Lithographic Technologies V - Characterization of a laser-produced x-ray source with a double-stream gas puff target for x-ray and EUV lithography
Fiedorowicz, Henryk, Bartnik, Andrzej, Daido, Hiroyuki, Jarocki, Roman, Rakowski, Rafal, Suzuki, Masayuki, Szczurek, Miroslaw, Yamagami, Susumu, Dobisz, Elizabeth A.Volume:
4343
Year:
2001
Language:
english
DOI:
10.1117/12.436680
File:
PDF, 541 KB
english, 2001