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SPIE Proceedings [SPIE Photomask 2001 - Monterey, CA (Wednesday 3 October 2001)] 21st Annual BACUS Symposium on Photomask Technology - Extended capability of laser writer for masks beyond 180-nm nodes
Cho, Sung-Yong, Lee, Jeong-Yun, Kim, Chang-Hwan, Choi, Seong-Woon, Han, Woo-Sung, Sohn, Jung-Min, Dao, Giang T., Grenon, Brian J.Volume:
4562
Year:
2002
Language:
english
DOI:
10.1117/12.458290
File:
PDF, 475 KB
english, 2002