SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Advances in Resist Technology and Processing XIX - Modeling of acid catalyzed resists with electron beam exposure
Fedynyshyn, Theodore H., Gillman, Jason R., Goodman, Russell B., Lyszczarz, Theodore M., Spector, Steven J., Lennon, Donna, Denault, Sandy, Bates, Robert H., Fedynyshyn, Theodore H.Volume:
4690
Year:
2002
Language:
english
DOI:
10.1117/12.474190
File:
PDF, 3.42 MB
english, 2002