SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - Investigation of the polymer systems for ArF resists
Yamana, Mitsuharu, Hirano, Masumi, Nagahara, Seiji, Kasama, Kunihiko, Hada, Hideo, Miyairi, Miwa, Kohno, Shinichi, Iwai, Takeshi, Fedynyshyn, Theodore H.Volume:
5039
Year:
2003
Language:
english
DOI:
10.1117/12.485105
File:
PDF, 346 KB
english, 2003