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SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Advances in Resist Technology and Processing XX - New materials for 193-nm bottom antireflective coatings
Weimer, Marc, Krishnamurthy, Vandana, Fowler, Shelly, Nesbit, Cheryl, Claypool, James B., Fedynyshyn, Theodore H.Volume:
5039
Year:
2003
Language:
english
DOI:
10.1117/12.485107
File:
PDF, 1.18 MB
english, 2003