SPIE Proceedings [SPIE Advanced Microelectronic Manufacturing - Santa Clara, CA (Sunday 23 February 2003)] Process and Materials Characterization and Diagnostics in IC Manufacturing - In-line e-beam inspection with optimized sampling and newly developed ADC
Ikota, Masami, Miura, Akihiro, Fukunishi, Munenori, Hiroi, Takashi, Sugimoto, Aritoshi, Tobin, Jr., Kenneth W., Emami, IrajVolume:
5041
Year:
2003
Language:
english
DOI:
10.1117/12.485225
File:
PDF, 229 KB
english, 2003