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SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 8 September 2003)] 23rd Annual BACUS Symposium on Photomask Technology - 157-nm alternating phase-shifting mask design and high-NA images
Chen, Yung-Tin, Meute, Jeff, Dean, Kim, Brooker, Peter D., Kimmel, Kurt R., Staud, WolfgangVolume:
5256
Year:
2003
Language:
english
DOI:
10.1117/12.518310
File:
PDF, 1.63 MB
english, 2003