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SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Metrology, Inspection, and Process Control for Microlithography XVIII - Spectroscopic ellipsometry-based scatterometry for depth and linewidth measurements of polysilicon-filled deep trenches
Hingst, Thomas, Silver, Richard M., Moert, Manfred, Reinig, Peter, Backen, Elke, Dost, Rene, Weidner, Peter, Hopkins, John, Dziura, Ted G., Elazami, Assim, Freed, ReginaVolume:
5375
Year:
2004
Language:
english
DOI:
10.1117/12.535646
File:
PDF, 803 KB
english, 2004