SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 13 September 2004)] 24th Annual BACUS Symposium on Photomask Technology - Flexible MRC rules for OPC
Cobb, Nicolas B., Miloslavsky, Eugene, Lippincott, George, Staud, Wolfgang, Weed, J. TracyVolume:
5567
Year:
2004
Language:
english
DOI:
10.1117/12.568420
File:
PDF, 94 KB
english, 2004