SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - Determination of mask induced polarization effects occurring in hyper NA immersion lithography
Teuber, Silvio, Smith, Bruce W., Bubke, Karsten, Hollein, Ingo, Ziebold, Ralf, Peters, Jan H.Volume:
5754
Year:
2005
Language:
english
DOI:
10.1117/12.598641
File:
PDF, 251 KB
english, 2005