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SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Metrology, Inspection, and Process Control for Microlithography XIX - Application of optical CD for characterization of 70nm dense lines
Cheung, Beverly, Silver, Richard M., Dusa, Mircea, Kiers, Ton, Cramer, HugoVolume:
5752
Year:
2005
Language:
english
DOI:
10.1117/12.599896
File:
PDF, 1.14 MB
english, 2005