SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Metrology, Inspection, and Process Control for Microlithography XIX - Optical characterization of 193nm amorphous carbon ARC films
Leng, Jingmin, Silver, Richard M., Opsal, Jon, Pois, HeathVolume:
5752
Year:
2005
Language:
english
DOI:
10.1117/12.600138
File:
PDF, 288 KB
english, 2005