SPIE Proceedings [SPIE Photomask Technology 2005 - Monterey, California (Monday 3 October 2005)] 25th Annual BACUS Symposium on Photomask Technology - The impact of mask birefringence on hyper-NA (NA>1.0) polarized imaging
Geh, Bernd, Weed, J. Tracy, Martin, Patrick M., Flagello, Donis G., Progler, Chris, Martin, Patrick M., Leunissen, Leonardus H. A., Hansen, Steve, de Boeij, WimVolume:
5992
Year:
2005
Language:
english
DOI:
10.1117/12.637483
File:
PDF, 861 KB
english, 2005