![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Optical Microlithography XIX - Simulation of dense contact hole (κ 1 =0.35) arrays with 193 nm immersion lithography
Raub, Alex K., Flagello, Donis G., Biswas, Abani M., Borodovsky, Y., Allen, G., Brueck, S. R. J.Volume:
6154
Year:
2006
Language:
english
DOI:
10.1117/12.656694
File:
PDF, 4.00 MB
english, 2006