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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Bias reduction in roughness measurement through SEM noise removal
Katz, R., Archie, Chas N., Chase, C. D., Kris, R., Peltinov, R., Villarrubia, J., Bunday, B.Volume:
6152
Year:
2006
Language:
english
DOI:
10.1117/12.661135
File:
PDF, 514 KB
english, 2006