SPIE Proceedings [SPIE 27th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 17 September 2007)] Photomask Technology 2007 - Study of impacts of mask structure on hole pattern in EUVL
Iriki, Nobuyuki, Naber, Robert J., Kawahira, Hiroichi, Arisawa, Yukiyasu, Aoyama, Hajime, Tanaka, ToshihikoVolume:
6730
Year:
2007
Language:
english
DOI:
10.1117/12.746592
File:
PDF, 1.50 MB
english, 2007