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SPIE Proceedings [SPIE 27th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 17 September 2007)] Photomask Technology 2007 - Detectability and printability of EUVL mask blank defects for the 32-nm HP node
Cho, Wonil, Naber, Robert J., Kawahira, Hiroichi, Han, Hak-Seung, Goldberg, Kenneth A., Kearney, Patrick A., Jeon, Chan-UkVolume:
6730
Year:
2007
Language:
english
DOI:
10.1117/12.746698
File:
PDF, 1.60 MB
english, 2007