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SPIE Proceedings [SPIE 27th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 17 September 2007)] Photomask Technology 2007 - Integration of OPC and mask data preparation for reduced data I/O and reduced cycle time
Morgan, Ray, Naber, Robert J., Kawahira, Hiroichi, Chacko, Manoj, Hung, Dan, Yeap, Johnny, Boman, MathiasVolume:
6730
Year:
2007
Language:
english
DOI:
10.1117/12.747300
File:
PDF, 293 KB
english, 2007